Product Details

CVD system equipment with MFCS / CVD system with high vacuum system/ CVD furnace

The 1200C series furnace workstation consists of a 1200C series tube furnace, a precision mass flow gas control station, a high vacuum station and other assembling parts. The max. working temperature of this workstation is 1200°C. . It is competent for the experiments as CVD, Diffusion and other thermo-treatments under vacuum status and shielding gas protected.

Specification of the CVD furnace system equipment:

tube furnace	Casing	Double layer steel casing with air cooling. Built in thermostat to control Cooling running automatically when case > 55C.
	Processing Tube	Material: Fused quartz
	Power	2.5KW
	Rated Voltage	AC 208-240V Single phase, 50/60Hz
	Heating Element	Resistance wire
	Working Temp.	Max. Heating Temp.: 1200CContinuous Working Temp.: 1100C
	Heat-up Rate	Heat-up rate: 1~20C/min programmable
	Heating Zone Length	Total heating zone: 440mmConstant Temp. Zone: 150mm
	Temp. Control	PID automatic control with 30 steps programmable segments. Temperature accuracy: 1 C Thermocouple: K type
	Vacuum Seal	One pair of stainless steel vacuum flange with: one mechanical pressure gauge two needle valves one KF-25 connector for the high vacuum station.
	Power	100~110W
	Rated Voltage	AC 208-240V Single Phase, 50/60Hz
High Vacuum Station	Structure	Mobile cart size: 600 (L) x 600 (W) x 700(H), mmMax. Loading: 600 Lbs on topVacuum sensor is included
	Working Range	From 1000 mbar to <1E-7 mbar
	Ultimate Pressure	<1E-8 mbar
Mass Flow Gas Control	Structure	3 channel MFC Made of 316 stainless steel with gas flow range as below: Controller : 1~500SCCM Different range of gas flow is available upon request 3 Channel gas go through a Gas mixing tank: 80X120mm Dimension: 600(L) x 600(W) x 700(H), mm
	Power	18W
	Rated Voltage	AC 208-240V, Single phase, 50/60Hz

Detailed photos of the CVD tube furnace system/ CVD system:

CVD tube furnace syetem with 3 gas channels

other series CVD system we can supply:

tube furnace with high vacuum system

science laboratory used CVD equipment for thin film research / CVD system