Specifications

GMPS-2010K RectangularCavity Microwave Plasma System, microwave plasma cvd

GMPS-2010K Rectangular Cavity Microwave Plasma System

 

Features: 

   1.0kW/2450MHz microwave power source    with programmable control system    provides adjustable output power from 0.1  to 1.0kW with low ripple and precisely regulation.

    Circulator, tuner, sampling dummy load   and waveguides consist of transmission    system, which insure isolation between magnetron and reflecting wave, and regulate best matching.

    The special designed wave guide with slots coupled large area microwave rectangular cavity as the reacting applicator, which have five window ports for place sample (φ150mm), viewer (φ150mm), vacuum ( CF-35 ), temperature sensor ( CF-35 ) and plasma diagnosis ( CF-35 ).

    It has very promise to excite an intense spatially stable plasma where the substrates be placed and realize a large area substrates films MPCVD with stable operation.

    Built in high vacuum system and two fine MFC systems.

    With Sample supporter moveable and temperature auto control

    Application: MPCVD research and middle-mass production for diamond or various kinds of films.

 

Specification
Frequency	2450±50MHz
Power Output	0.3-1kW Continue Adjustable
Power Stability	< ±2% ( at specific Power level )
Wave guide	WR-340 with FD-340 Flange
Control Interface	RS-232 Program Controllable
Power Supply	380V±10%  3 Phase 4 Line
Cooling Water	> 3 L / min
System VSWR	≤ 1.2
Leakage	< 5mW/cm2 ( IEC Standard )
Window Dimension	440(L)×200(W)×15(H) mm
Cavity Dimension	440(L)×200(W)×200(H) mm
Vacuum System	P < 1×10-1 Pa.
Gas MFC System	2 MFC ( Mass Flow Control )
Size	1800(L) x 800(W) x 1500(H)mm
Weight	500kg