The electron gun magnetron sputtering  coating machine

Product Description:

Thermal evaporation and electron beam evaporation coating function, but also has the function magnetron sputtering.

A machine with multiple functions. The equipment is mainly equipped with thermal evaporation chamber left and right electron gun chamber, magnetron sputtering room. Thermal evaporation chamber in which the left for a variety of metals, organics vacuum coating (except refractory metal); electron gun chamber for vacuum deposition of refractory metals, non-metallic materials and high-purity thin film; magnetron sputtering chamber for preparing the target can be made of a metal film, a metal oxide, a carbide, an alloy or the like.

Parameter:

1.Ultimate vacuum pressure: 8 × 10-5 Pa.
2. Magnetron target diameter (mm): 50.
3. Vacuum extraction recovery time (min): <20.
4. Left thermal evaporation chamber: Φ500 × 400.
5. Right electron gun, magnetron sputtering chamber: Φ500 × 500, manual gas spring lid.
6. Crucible volume: 40ml.