Product Details

Magnetron Sputtering Coating machine production line

production line

Description:

With high transparency in visible light and effective in frared-insulation LOW-E glass serves the function of transparecy and heat-insulating.Ultraviolet light cannot get through the LE-E glass,which could prevent the color fading of furniture.

(1) Type of equipment: horizontal continuous magnetron sputtering coating line

(2) Uniformity of the film: in the effective deposition area, the film thickness uniformity ≤ 5%

(3) cathode structure design: adopts medium frequency twin rotary cathode, target specifications depending on the product

(4) Transmission mode: adopts the mold of dual-friction drive loaded into the film. The whole production line speed using Variable frequency and motor drive, the speed can be adjusted

(5) coating temperature control: according to customer requirements using different heating methods and temperature stability

(6) Control system: adopts the configuration software and PLC binding mold, can achieve man-machine conversation, can make the necessary timely intervention on the survival process. During the operation of alarm and fault display.

Application:

put radiation glass ,touch screen, building materials,etc

Technical Parameters:

Model and Technical Parameters of VAKIA-MSC Series Vacuum Magnetron Sputtering Coating Machine
Performance/Model	VAKIA-MSC-700	VAKIA-MSC-900	VAKIA-MSC-1000	VAKIA-MSC-1250	VAKIA-MSC-1400	VAKIA-MSC-1600
Size of coating chamber	Ø700*H900mm	Ø900*H1100mm	Ø1000*H1200mm	Ø1250*H1350mm	Ø1400*H1600mm	Ø1600*H1800mm
Power supply type	Filament power supply, pulse bias power supply, DC magnetron power supply, intermediate frequency magnetron power supply, radio frequency magnetron power supply, linear ionization source
Structure of vacuum chamber	Vertical double door, vertical front door structure, rear air exhaust system
Material of vacuum chamber	High-quality stainless steel cavity
Limit vacuum	6.0*10-4Pa
Pump-down time (no-load)	Pump the atmosphere to 8.0*10-3>Pa ≤15 minutes
Vacuum acquisition system	Diffusion pump or molecular pump + Roots pump + Mechanical pump + Holding pump (the specific model can be configured according to customer requirements)
Coating mode	Magnetron sputtering coating
Film type	Metal film, reactive film, compound film, multilayer film and semiconductor film
Magnetron target type	Rectangular magnetron target, cylindrical magnetron target and twin magnetron targets
Magnetron supply power and number of magnetron targets	Select according to different coating process and customer requirements
Bias power supply	10KW/1 unit	20KW/1 unit	20KW/1 unit	30KW/1 unit	40KW/1 unit	50KW/1unit
Rotating mode of workpiece turntable	Planetary revolution and autorotation, variable frequency speed regulation (controllable and adjustable)
Process gas	3-path or 4-path process gas flow control and display system, selective automatic gassing system
Cooling mode	Water circulation cooling mode, cooling water tower or industrial water cooler or deep cooling system. (Provided by customers)
Control mode	Manual/automatic integration mode, touch screen operation, PLC or computer control
Total power	30KW	35KW	40KW	50KW	65KW	80KW
Alarm and protection	Alarm water shortage, overcurrent and over-voltage, open circuit and other abnormal conditions of pumps, targets and so on and execute relevant protective measures and electric interlock function
Equipment area	W2m*L3m	W2.5m*L3.5m	W3m*L4m	W4m*L5m	W4.5m*L6m	W5m*L7m
Other technical parameters	Water Pressure ≥0.2MPa, Water Temperature ≤25°C, Air Pressure: 0.5-0.8MPa
Remarks	The specific configuration of coating equipment can be designed according to process requirements of coating products

Samples: