Product Details

Product Description

Plasma enhanced chemical vapor deposition equipment/graphene Furnace

Featrues of graphene furnace

1.Lower temperature processing compared to conventional CVD.
2.Film stress can be controlled by high/low frequency mixing techniques.
3.Control over stoichiometry via process conditions.
4.Offers a wide range of material deposition, including SiOx, SiNx, SiOxNy and

Amorphous silicon (a-Si:H) deposition.

Technical parmaters of graphene furnace

Plit Tube furnace	Input power: 208 – 240V AC, 1.2kW 1200°C Max. working temperature for < 60 minutes 1100°C Max for continuous heating High purity quartz tube 2"OD x 1.7"ID x 39.4" Length 30 segments programmable precision digital temperature controller 8" (200mm), single zone. 2.3" (60mm) (+/-1°C) @ 1000°C
Plasma RF Generator	Output Power:5 -300W adjustable with ± 1% stability RF frequency: 13.56 MHz ±0.005% stability Reflection Power: 200W max. Matching: Automatic RF Output Port: 50 Ω, N-type, female Noise: <50 dB. Cooling: Air cooling. Power : 208-240VAC, 50/60Hz
Vacuum Flange and Fittings	Vacuum flange set is made of stainless steel 304. Left flange assembly includes a KF-25 vacuum port, two KF-25 quick clamp, A KF-25 right angle valve, a KF-25 vacuum bellows, a flange Support 1/4 O.D Hose fitting, and a needle valve. Right flange assembly includes a digital pirani gauge, 1/4 O.D tube fitting, 1/4" Feedthrough and a needle valve.
Vacuum Pump	AC 220V 50 Hz 1/2HP 375W 2 Liter /S or 120 liter/m Oil trap (inlet) and exhaust filter (outlet) are installed. Max. vacuum: 10-2 torr
Warranty	12 month (exclusive wearing part)