1200C Vacuum crucible annealing furnace for semiconductor wafer
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1200C Vacuum crucible annealing furnace for semiconductor wafer
1200C Vacuum crucible annealing furnace is composed by quartz crucible or alumina crucible and stainless steel flange.It is mainly used for sintering of high pure compound under vacuum or inert atmosphere, annnealing or spreading of semiconfuctor wafer and roasting or sintering of ceramic material.It have below outstanding features:
1:Max Vacuum can upto -0.1Mpa.
2: Good leak tightness.
3:Perfect heating preservation.
4:Better Temperature uniformity.
5: Precise temperature control.
6:Excellent thermal Insulation .
Product Name: | 1200C Vacuum Crucible annealing furnace |
Code No# | HS-1200VCB |
Max Tempearture: | 1200C(<3 Hours) |
Working Tempearature: | 1100C(Continuous) |
Chamber Size: | Dia190*H340mm |
Max Vacuum: | -0.1Mpa |
Temperature Controller: | 50 Segment programmable and PID auto control |
Temperature Accuracy: | +/-1C |
Heating Elements: | Kanthal resistance wire |
Heating Rate: | 20C/Minutes(Suggest<20C) |
Thermocouple: | K Type(0-1200C) |
Rated Power: | 3 KW |
Rater Voltage: | AC220V (50/60hz) |
Gross Weight: | 140kg |
Dimension; | 885*830*1125MM |
Certification: | CE&ISO9001:2000 |
Standard package included with the furnace
Part description | Quantity | ||||
Thermal couple | 1 pc | ||||
Stainless steel hook | 1 pc | ||||
Thermal gloves | 1 pr | ||||
Operation manual | 1 pc |
Package: Plastic paper inside, Polyfoam filled, Wooden box outside.
Payment: L/C T/T, West union,etc.
Shipping and Delivery: by air , in 15 days after receiving the payment