Multi-function coating machine, buy Vacuum PVD coating machine for metal,ceramic and glass(Huicheng) on China Suppliers Mobile

Product Details

Vacuum PVD coating machine for metal,ceramic and glass(Huicheng)

We have different models vacuum PVD coating machine,it can coating different products, and different materials,suach as, metal,glass,ceramic, plastic,etc.Please check details in below:

Multi-function ion plating equipment

The equipment integrated three technology of DC magnetron sputtering, middle frequency sputtering and electric arc ion evaporation, combining the linear ionize source and pulse bias coating to thin the deposition particles.

Characteristic: 1. The principle of magnetron sputtering is based on the cathode glow discharge theory, expanding the cathode surface magnetic field close to the surface of workpiece, to increased the ionized rate of sputtering atoms. It retains the delicate of the magnetron sputtering and increased the glossiness.

2.The performance of electric arc plasma evaporation source is reliable, be able to work under the current 30A when optimize the cathode and magnetic field structure coating, and the coating film and substrate interface produce atomic diffusion, plus the feature of the ion beam assisted deposition.

Applied industry: The equipment is widely used in IPG clocks, IPS watches and clocks, guns IP, mobile phone shell, hardware, sanitary ware, cutters, anti-friction tools, dies and mould, etc. It can coat TiN, TiCN, CrN, TiALN, TiNbu, TiCrN, ZrN, and various kinds of diamonds film (DLC).

Technical parameter:

Mode Dimension	JTL-900	JTL-1100	JTL-1250
	900*1000mm	1100*1000mm	1250*1100mm
Coating mode and main confirguration	Six multi-arc targets + one set of column targets + one set of plane rectangle magnetron sputtering targets	Six multi-arc targets + a pair of twin (MF)magnetron sputtering targets	Twelve multi-arc targets + two sets of plane rectangle magnetron sputtering targets+ a pair of twin (MF)magnetron sputtering targets
Power source	Electric arc power, DC magnetron power, MF magnetron power, filament power, pulse power, linear ionized source.
Process gas control	Quality flowmeter + electromagnetism ceramic valve
Vacuum chamber structure	Vertical single(side) door, pump system postposition, double water-cooling
Vacuum system	Molecule pump +Roots pump +Mechanical pump(5.010^-5Pa) Diffusion pump +Roots pump +Mechanical pump(5.010^-4Pa)
Workpiece baking temperature	Normal temperature to 350 centi-degree PID control, radiation heating.
Workpiece motion mode	Public rotation Frequency control: 0-20 rotation per minute
Measure mode	Number display composite vacuum gauge: from atmosphere to 1.0*10^-5Pa
Control mode	Manual/Automatic/PC/PLC + HMI/PC four choice of control mode
Remark	We can design the dimension of the equipment according to customer’s special technique requirement.

Samples coated by this model of vacuum pvd coating machine:

Multi-arc ion coating machine

Multi-arc ion coating machine is an ion coating machine of efficiency, harmless and pollution-free. It has the features of fast deposition rate , great ionization rate, big ion energy, easy operation, low cost, large productive capacity, etc.

Characteristic: The principle of the electric arc is integrating cold cathode arc discharge self-sustained light unite pulse technique and magnetron sputtering technology, thinning the particles to improve the properties of the film. It can coat on the surface of the metal as well as nonmetal.

Applied industry: It can be used to coat metal film, titanium nitride, titanium carbide, and zirconium nitride, chromium nitride and titanium, nickel, chromium, copper , and other compounds film, multi-layer super-hard film, nitrogen-doped titanium film and the alloy film, and in a very short time to complete all the machining process, it is a highly efficient multi-functional coating equipment.

Dimension	LH-900	LH-1215	LH-1618
	900*1000mm	1250*1500mm	1600*1800mm
Coating mode and main configurations	Eight multi-arc targets	Fourteen multi-arc targets	Twenty multi-arc targets
Power source	Electric-arc power, Filament power, Pulsed bias power supply
Process gas control	Mass flow meter + Electromagnetic ceramic valve
Vacuum chamber structure	Vertical side opening door, pump system postposition, double water cooling
Vacuum system	Diffusion pump +Roots pump +Mechanical pump(8.0*10^-4Pa)
Workpiece baking temperature	Normal temperature to 350 centi-degree PID control, radiation heating.
Workpiece motion mode	Public rotation Frequency control: 0-20 rotation per minute
Measure mode	Number display composite vacuum gauge: from atmosphere to 1.0*10^-5Pa
Control mode	Manual/Automatic/PC/PLC + HMI/PC four choice of control mode
Remark	We can design the dimension of the equipment according to customer’s special technique requirement.