Si3N4  target
Processing method: powder hot-pressing
Purity: 4N min.
Tolerance: +/-0.2mm
Relative density: 80% min. 

Surface condition: Ground

Dimension:  W:210mm max.

                        L: 210mm max.

                       T: 21mm  max.

Shape: round, rectangle or as per your drawing

For more information, pls contact us directly.