gr1 ti sputtering titanium target
gr1 ti sputtering titanium target
gr1 ti sputtering titanium target

gr1 ti sputtering titanium target

USD $15 - $40 /Piece

Min.Order:1 Piece

Supply Ability:
10000 Piece / Pieces per Month
Port:
tianjin shanghai
Payment Terms:
T/T L/C D/P D/A Credit Card PayPal

Quick Details View All >

Place of Origin:
Shaanxi, China
Brand Name:
OY
Model Number:
gr1 ti sputtering titanium target
Application:
industry
Technique:
polish
Dimensions:
as your need

Baoji Oyuan Metal-Tech Co., Ltd.

Business Type: Manufacturer,Trading Company
Baoji Shaanxi China
Main Products: Titanium ,Titanium alloy ,tungsten ,molybdenum ,tantalum

Product Details

gr1 ti sputtering titanium targetgr1 ti sputtering titanium targetgr1 ti sputtering titanium targetgr1 ti sputtering titanium target

gr1 ti sputtering titanium targetgr1 ti sputtering titanium targetgr1 ti sputtering titanium targetgr1 ti sputtering titanium target

gr1 ti sputtering titanium target

gr1 ti sputtering titanium targetgr1 ti sputtering titanium target

 gr1 ti sputtering titanium target

ItemProduct nameManufacturing methodProduct sizeRelative density
1Chromium Targethot isostatic pressing(HIP)maximum size1200*250mm>99.0%
2Titanium Targetsmeltingmaximum size500*300mm>98.0%
3Niobium Targethot isostatic pressing(HIP)maximum size1200*250mm>98.0%
4Cr-Al Targethot isostatic pressing(HIP)maximum size1200*250mm>98.0%
5Ti-Al Targethot isostatic pressing(HIP)maximum size1200*250mm>99.0%
6Si-Al Targethot isostatic pressing(HIP)maximum size1000*200mm>99.0%
7Cr-Si Targethot isostatic pressing(HIP)maximum size800*180mm>96.0%
8W-Ti Targethot isostatic pressing(HIP)maximum size800*180mm>99.0%
9Ni-Cr TargetThe vacuum melting, forging and rollingmaximum size500*300mm>98.0%
10molybdenum alloyhot isostatic pressing(HIP)maximum size800*180mm>99.0%
11Tubulose Targethot isostatic pressing(HIP)Length<1.2m,Outside<300mm>96.0%

gr1 ti sputtering titanium target

ItemProduct namePurityGrain sizeConventional proportionsProduct Advantage
1Chromium Target99.5%-99.95%(2N5-3N5)<100μm High purity, high density, fine and uniform grain size, low oxygen content.
2Titanium Target99.5%-99.99%(2N5-4N)<180μm 
3Niobium Target99.5%-99.95%(2N5-3N5)<100μm 
4Cr-Al Target99.5%-99.95%(2N5-3N5)<100μmCr-70Al,Cr-50Al,Cr-30Al(at%)
5Ti-Al Target99.5%-99.95%(2N5-3N5)<100μmTi-30Al,Ti-50Al,Ti-67Al,Ti-70Al(at%)
6Si-Al Target99.5%-99.95%(2N5-3N5)<50μmSi-10Al,Si-30Al,Si-50Al (wt%)
7Cr-Si Target99.5%-99.95%(2N5-3N5)<100μmCr-50Si(wt%)
8W-Ti Target99.5%-99.95%(2N5-3N5)<100μmW-10Ti(wt%)
9Ni-Cr Target99.5%-99.99%(2N5-4N)<150μmNi-20Cr(wt%)
10molybdenum alloy99.5%-99.95%(2N5-3N5)<100μm 
11Tubulose Target99.5%-99.95%(2N5-3N5)<50μmCr,Ti,Al,Nb,TiAl,SiAl,Mo alloy,CrAl,NiCr,CrTi,TiSi and so on.Produce large aspect ratio, one-piece tubular target. Compared with planar targets, which has a uniform and fine grain size, high utilization of materials, coatings good continuity, uniform and dense coating composition and so on.

gr1 ti sputtering titanium target

gr1 ti sputtering titanium target

gr1 ti sputtering titanium target

gr1 ti sputtering titanium target

Contact Supplier

Mr. Jianfeng Guo Chat Now
Telephone
86-917-3296800
Address
Taicheng Road Baoji,Shaanxi

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