Type

CK-700

CK-900

CK-1000

CK-1250

CK-1400

CK-1600

Vacuum chamber size

700×H

900mm

900×H

1100mm

1000×H

1200mm

1250×H

1350mm

1400×H

1600mm

1600×H

1800mm

Power supply

Pulse bias power supply; DC magnetron power supply

(can be equipped with different power supply by requested)

Vacuum chamber structure

Vertical single/double door, rear vacuum acquisition system

Vacuum chamber material

SUS-304 superior stainless steel

Ultimate vacuum

8.0×10^-4Pa

8.0×10^-4Pa

8.0×10^-4Pa

8.0×10^-4Pa

8.0×10^-4Pa

8.0×10^-4Pa

Pumping speed

From 1 atm to 6.7×10^-3Pa take 8~15min (room temperature, clean and unload)

Vacuum system

Diffusion pump + roots pump + rotary vane pump + holding pump

(can be adjusted by requested)

Magnetron target type

Planar magnetron target, cylindrical magnetron target

Pulse bias power supply

25KW

25KW

30KW

30KW

40KW

40KW

Shelves rotation system

Planetary revolution and rotation, frequency control, upper and base rotation shelves, number of axes equipped by requested.

Process gas

Mass flow controller (3-4 ways), manual or automatic processing gas systems

Cooling system

Water-cooling system. Cooling water tower, industrial cooling water machine or deep water cooling system is needed to purchase separately. ( or supplied by user)

Control system

Manual or PLC + touch screen

Alarm and protection

Water pressure alarm, air pressure alarm, over current protection, execution on related protective measures and electrical interlock systems.

Foot print

W3m×

L3.5m

W3m×

L3.5m

W3.5m×

L5m

W3.5m×

L5m

W4.5m×

L5.5m

W4.5m×

L5.5m

Other technical data

Water pressure≥0.2MPa, water temperature≤25℃, air pressure 0.5-0.8MPa

Remarks

Specific size can be designed by user’s requested.

Customizable vacuum chamber size range:  500-3000mm, H: 500-3000mm.