Product Details

Specifications

plasma cleaner
High purity quartz chamber
Low, medium, and high power settings
Easy operating

Different Gas Vacuum Plasma Cleaner

Brief introductin of plasma cleaner
Plasma cleaner is mainly used to pre-clean nanoscale organic contamination on wafer with N2,

Oxygen, air, or mixed gas plasma. The removal rate can reach about 10 nm/min. It is mainly used

for pre-cleaning wafer, metal, semiconductor, high polymer material, etc.

Outstanding features of pasma cleaner

High purity quartz chamber
Low, medium, and high power settings
Easy operation and environmental friendly

Main technical specification of plasma cleaner

Input power	AC110V~220V for your option
RF Power(adjustable)	Low setting	716V	10mA	7.2W
	Medium setting	720V	15 mA	10.5W
	High setting	740V	40 mA	30W
Plasma Chamber	6’’ diameter X 6.5’’ length quartz chamber (which can be customized. in to Dia. 3” X6.5’’ Length or Dia.8”X12” Length, etc) Equipped with built-in hinged type front flange
Vacuum pump and Valve	Double stage rotary vane vacuum pump with exhaust filter Max. total pressure of 30 mTorr Needle valve to control gas flow and chamber pressure 3-way valve to quickly switch from bleeding in gas, isolating the chamber and venting
Input gas	Many inert gas can be choosen for plasma cleaning, such as, N2, Ar, Air, and mixed gas (no flammable gas)
Optional	Digital vacuum gauge is used for monitoring chamber pressure accurately Wafer quartz boat
Warranty	One year limited warranty with lifetime support