Specifications

high purity Niobium target
thickness 6,9,12,18 mm
Purity: 99.9%, 99.95%
Shape: rectangle, circular, rotatable

high purity Niobium target

 

thickness 6,9,12,18 mm

Purity: 99.9%, 99.95%

Shape: rectangle, circular, rotatable

Construction for rectangle target: single piece or multiple pieces with butt or beveled jointed

Competitive pricing, stable quality, quick delivery

 

Chemical Element (weight %, max.)
UNS	Type	C	O	N	H	Ta	Fe	Ti	W	Mo	Si	Ni	Zr	Nb
R04210	Pure	0.004	0.015	0.003	0.0015	0.05	0.004	0.002	0.005	0.005	0.004	0.002	/	Bal.
R04261	Nb-Zr	0.004	0.015	0.003	0.0015	0.05	0.004	0.002	0.005	0.005	0.004	0.002	1.00	Bal.
/	Nb-Zr	0.004	0.015	0.003	0.0015	0.05	0.004	0.002	0.005	0.005	0.004	0.002	10.0	Bal.

 

ReTi Metal supply kinds of metal & alloy sputtering target for various industries in a wide range of shapes and sizes.

 

Metals & alloys

Chromium

Copper

Hafnium

Molybdenum, Mo-Nb, Mo-Ti, Mo-W

Nickel, Ni-Cr, Ni-V

Niobium, Nb-Ti, Nb-Zr

Tantalum, Ta-W

Titanium, Ti-Al, Ti-Cr, Ti-Cu, Ti-Pd

Tungsten, W-Ag, W-Re

Zirconium, Zr-Ti

 

Purity: 99%-99.999%, dependant on different materials

 

Shape and form:

Square, rectangle, circular, triangular, rotatable

Single piece or multiple pieces construction. Jointed by butt or beveled for multi-segmented targets.

OEM design available

 

Surface and tolerance:

Precision fabricated and grounded. Roughness Ra 0.8-Ra 3.2 for target surface

 

Process:

HIP, Vacuum melting or Press-sintered. Dependant on different materials and application.

 

Typical application:

Flat Panel Displays, Optical Discs, Automotive & Architectural Glass, WEB Coating, Decorative, Hard Coatings, Solar Cells, Magnetic Data Storage Devices, Semiconductors, Optical Communications, Electron Microscopy