Product Details

tungsten and tantalum sputtering target for magnetron sputtering machine system

Place of Origin Hunan, China
Brand Name Newmetal
Model Number ≥99.95%
Application sputtering target
Shape Round
Material tantalum, molybdenum, tungsten, tantalum are available
Dimensions Customzied
Chemical Composition ≥99.95% tantalum

Product Features

tungsten and tantalum sputtering target for magnetron sputtering machine system

Product Description

 

Tantalum Target

Standard: GB/3629-2006

Brand: RO5200, RO5400, RO5252(Ta-2.5W), RO5255(Ta-10W)

Purity: ≥99.95%

Form: Annealing or hard

Specification: φ(40-50)mm*T(3-28)mm

Recrystallization:≥95%

Grain size:≥40μm

surface roughness:≤Ra 0.4

Flatness: ≤ 0.1mm  

Diameter tolerance:±0.254mm

Special requirements can be discussed between the parties.

Special requirements can be discussed between the parties.
Tantalum target is a very important material in thin film technology. We can make tantalum target with purity being above 99.95%, small grain size, and good consistent state of recrystal microstructure and three axial positions. In this way, the oxidation film sputtered from cathodic tantalum sputtering target is even and resistant to other chemicals. Tantalum sputtering target has been widely used in fiber optics, semiconductor chip, integrated circuit and military areas. Tantalum-projectile has been in development successfully.

 

Niobium Target

Standard: GB/3629-2006

Brand: RO5200, RO5400, RO5252(Ta-2.5W), RO5255(Ta-10W)

Purity: ≥99.95%

Form: Annealing or hard

Dimensions:

Niobium circular targets:φ(25-400)mm×T(3-28)mm

Niobium planar targets: T(1-20)×W(10-1000)×L(200-2000)mm

Recrystallization:≥99.95%

Grain size:≥40μm

surface roughness:≤Ra 0.4

Flatness: ≤0.1mm

Diameter tolerance:±0.254mm

Special requirements can beagreed between the parties.

For niobium sputtering target, we focus on to offer our customers with high purities ranging from 3N5 to 5N, fine and uniform grain size, elimination of strong texture banding, and early target life size stability. We can offer planar and rotary niobium targets with different sizes.

According to your requirements, we can produce all kinds of niobium crucible, niobium flange, niobium screw, niobium heating products, and niobium insulation, tantalum profiled product. If you have any special requirement, please contact us.

tungsten and tantalum sputtering target for magnetron sputtering machine system

Company Information

Zhuzhou Newmetal Materials Co., Ltd.  is a refractory metal manufacturer specializing in the raw material and deep-processing product of tungsten, molybdenum, tantalum, niobium, rhenium and tungsten carbide.

• We have conquered the technological difficulties in welding between the tungsten carbide wear-resistant material and stainless steel-based and iron-based. The geometrical tolerance of weldment can be controlled in level A.

• Relying on powder metallurgy institute and engineering materials institute of Central South University, We have established a production-learning-research base to provide powerful technologic support for products R&D. And we have the whole production equipment from mixing to finish machining, including the world’s most advanced cold isostatic pressing machine which can manufacture the widest and longest plate.

•Our 21 technicians, 10 after-sales personnel and 120 manufacturing workers are all heartedly at your service.

 

Contact Us

 

 

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