Product Details

Quartz crucible of arc melting used for semiconductor industry is the essential basic material for pulling monocrystalline silicon and developing L S I circuit. It has the advantages of high purity, high temperature resistance with big size, good thermal insulation, economization on energy, quality stability etc.

We also can produce various specifications oftransparent and translucent crucibles. Crucibles can be produced according to the standard or produced on customer's required specification and shap.

Content	Density	Compressive Strength	Max service temp
SiO2≥99.9%	2.20-2.30 g/cm3	1000 Mpa	1450°C

opaque quartz crucible

Density 20°C kg.m-3(x103)	2.2
Coefficient of expansion 25-300°C°C-1(x10-6)	0..56
Softening point °C	1670
Annealing point°C	1210
Strain pont°C	1110
Youngs modulus(pa)	7.3*1010

Fused quartz crucible

Theraml conducticity	1.38(w/mok)
Coefficient of thermal expansion(0-1000°C)	0.55(10-5/°C)
Normal operating temperature Continuous usage	~1050°C
Normal operating temperature Non-continuous usage	~1250°C
Strain point	~1075°C
Strain point	~1180°C
Hot procesing temperature	~1700-2100°C
Devitrification temperature	Starting at ~1000°C,high temperature accelerates devitrification ,esp.with surface contaminants such as alkaline solutions ,salts and vapors.

Customization available