The semiconductor industry uses a large amount of ultrapure water to rinse contaminants from the surface of the silicon wafers that are later turned into computer chips used in devices we use every day. The ultrapure water used in semiconductor industry is by definition extremely low in contamination,for the risk that the contamination from the chemical residue and particles may end up back in the UPW feed water and result in product defects. Modern Ultrapure Water systems are very effective at removing ionic contamination down to parts per trillion levels (ppt) whereas organic contamination of ultrapure water systems is still in the parts per billion levels (ppb). 
 

EDI (Electrodeionization) is a revolutionary water treatment technology; it is a membrane separation desalination technology that skillfully combined the electrodialysis technology and ion exchange technology together, which is high-tech, green and environmental protection technology.
EDI equipment uses the RO outlet water as feed water. The resistivity of RO outlet water is normally 40-2μS/cm(25℃), the resistivity of EDI outlet water can reach 18MΩ.cm (25℃) normally. According to the application of deionization water and the setup of the system, EDI outlet water can meet the requirements of resistivity 1-18.2MΩ.cm (25℃).
The advantages of EDI equipment are continual water production, no acid and alkali regeneration, unattended operation etc. It has been replacing the mix bed as the fine treatment equipment gradually. Due to its higher environmental protection character, easy in operation, EDI has been accepted by more and more people and used in pharmaceutical, electronic, electricity, and chemical industry widely. Its appearance is a revolutionary progress of water treatment, which marked the water treatment industry finally entered into green industry.

 Feed water to EDI parameters