1.Grade: RO5200, RO5400, RO5252 (Ta-2.5W), RO5255 (Ta-10W)
2.Standard: ASTM B521-98, GB/T14841, ASTMB365, ASTMB708, ASTM B364-92
3.Purity:≥ 99.95% or 99.9%
4.Generally Size:
Dia: 30-1000mm
Thickness: 0.07-10mm
5.Characteristic:
Density: 16.6 g/cm3
Certificate: ISO9001:2008
6.Application:
Used in laboratory equipment.
Used as a substitute for platinum.
Used in manufacturing superalloys and electron-beam melting.
Used in metallurgical, machinery processing, glass, and ceramic industries.
Used as a superalloy additive in nickel-based alloys.
Used for sputtering targets.
Used for artificial ears
Used to make glass or metal seal
Technical parameters
Strict quality control system
--- Each link of the production will be strickly controled, ensuring without one unqualified product being out from our company.
Products :plate, bar, wire, disc, tube, foil ,target,boat ,strip and so on.
Supply tantalum crucible which quality as well as functions has been proved by a scrupulous test.High quality+ Best price
Recommend size
| Form | Thickness, Dia., Wall inches (mm) | Width, Length inches (mm) |
| Tantalum Foil | 0.001“ to 0.005“ (0.025 to 0.1270 mm) | 12“ maximum width x coil (30.5 mm max. width x coil) |
| Tantalum Sheet | 0.005“ to 0.020“ (0.1270 to 0.50 mm) | 36“ maximum width x coil (915 mm max. width x coil) |
| Tantalum Sheet | 0.015“ to 0.060“ (0.380 to 1.524 mm) | 40“ width x coil (1000 mm width x coil) |
| Tantalum Round Disk | Thickness: 0.060" to 0.125" (1.524 to 3.175 mm) | Up to 37 in diameter |
| Tantalum Plate | 0.060“ to 0.125“ (1.524 to 3.175 mm) | width not to exceed 40“ (1000 mm) |
Grade(UNS) | Annealed | ||
Tensile strength min, psi (MPa) | Yield strength min,psi (MPa)(2%) | Elongation min, % (1 inch gage length) | |
Pure Ta (RO5200, RO5400) | 30000 (207) | 20000 (138) | 20 |
Ta-10W (RO5255) | 70000 (482) | 60000 (414) | 15 |
Ta-2.5W (RO5252) | 40000 (276) | 30000 (207) | 20 |
Ta-40Nb (RO5240) | 35000 (241) | 20000 (138) | 25 |
Chemistry % | |||||||||||||
Designation | Chief component | Impurities maxmium | |||||||||||
Ta | Nb | Fe | Si | Ni | W | Mo | Ti | Nb | O | C | H | N | |
Ta1 | Remainder | 0.005 | 0.003 | 0.002 | 0.006 | 0.006 | 0.002 | 0.04 | 0.015 | 0.005 | 0.0015 | 0.006 | |
Ta2 | Remainder | 0.01 | 0.01 | 0.005 | 0.02 | 0.02 | 0.005 | 0.08 | 0.02 | 0.01 | 0.0015 | 0.01 | |
TaNb3 | Remainder | 3.5 | 0.01 | 0.01 | 0.005 | 0.02 | 0.02 | 0.005 | 0.02 | 0.01 | 0.0015 | 0.01 | |
TaNb20 | Remainder | 17.0-23.0 | 0.01 | 0.01 | 0.005 | 0.02 | 0.02 | 0.005 | 0.02 | 0.01 | 0.0015 | 0.01 | |
Ta2.5W | Remainder | 0.005 | 0.003 | 0.002 | 3.0 | 0.006 | 0.002 | 0.04 | 0.015 | 0.005 | 0.0015 | 0.006 | |
Ta10W | Remainder | 0.005 | 0.003 | 0.002 | 11 | 0.006 | 0.002 | 0.04 | 0.015 | 0.005 | 0.0015 | 0.006 | |
Tantalum and Tantalum Alloy
R05200, unalloyed tantalum, electron-beam furnace or vacuum-arc melt, or both
R05400, unalloyed tantalum, powder-metallurgy consolidation.
R05255, tantalum alloy, 90 % tantalum, 10 % tungsten, electron-beam furnace of vacuum-arc melt, or both.
R05252, tantalum alloy, 97.5 % tantalum, 2.5 % tungsten, electron-beam furnace or vacuum-arc melt, or both.
R05240, tantalum alloy, 60 % tantalum, 40 % niobium, electron-beam furnace or vacuum-arc melt.
Advantage
Tantalum features high melting point , low vapor pressure , good cold processability ,excellent chemical stability , good resistance to corrosion , high dielectric constant ,in surface oxide film .widely used in many industries such as electronics ,metallurgy, chemical processing , hard alloy cutters , aerospace and aviation.
Tantalum features high melting point , low vapor pressure , good cold processability ,excellent chemical stability , good resistance to corrosion , high dielectric constant ,in surface oxide film .widely used in many industries such as electronics ,metallurgy, chemical processing , hard alloy cutters , aerospace and aviation.
