Automatic optical vacuum coating machine for lens
Equipment Introduction
Automatic optical coating machine for lens equip with different evaporation source, electron gun, ionization source and film thickness gauge, it used for vapor deposition on the surface of metal, oxides, compound and other high melting point materials.
Features:
1) Capable of equipping ion source or plasma gun for depositing multi-layer and precise optical coatings.
2) When equipped substrate reverses mechanism, the optical coating machine would greatly reduce the processing time, get higher throughput, and lower production cost per unit.
3) With its high-performance layer monitoring system and computerized system, it can fulfill precise thickness requirement for optical layer coating.
4) Process control system runs on windows system interface and easy to use.
5) Repeatable and reliable coating.
Applications:
1. Anti-reflection (AR) film, reflective film, filters film, beam-splitting film, bandpass membrane, dielectric film, high reflectivity film, color reflection film and so on.
2. Wide range of applications for such field as auto reflective glass, telescope, spectacle lens, camera lens; PTV/ Liquid crystal projector lens; dichroic filter/ mirror; IR/ UV cut filter and so on.
Coating Samples:
optical coating machine Main Technology Specifications:
System/Model | OEC-900 | OEC-1100 | OEC-1350 | ||||
Chamber Size | Diameter (mm) | 900 | 1100 | 1350 | |||
Height (mm) | 1150 | 1250 | 1500 | ||||
Main Performance | Ultimate Pressure | 10-4Pa | |||||
Operation Pressure | From 1 ATM to 2.0 x10-3pa within 15 minutes (no load) | ||||||
Substrate Temp | 350°C (Max) | ||||||
Pumping System | Rotary Pump | 3,000 L/min | 3,000 L/min | 3,000 L/min | |||
Booster Pump | 600 M3/ hour | 600 M3/ hour | 1,500 M3/ hour | ||||
Diffusion Pump | 20,000L/sec x 1 | 15,000L/sec x 2 | 45,000L/ sec x 1 | ||||
Layer Monitoring System | Optical Monitor | LP Broad Band Monitor 380mm~1,050mm | |||||
Crystal Monitor | Single Sensor/ Six-pcs Sensor Head | ||||||
Vacuum Gauge | Pirani +Cold Cathode (1ATM ~10-9 Torr/1ATM ~10-7Torr) | ||||||
Evaporation Source | E-Beam Gun | ||||||
Rotation System | Planetary or Dome | ||||||
Ion Source | Optional | ||||||
Cooling water flow rate | 80 L/min | 100 L/min | 150 L/min | ||||
Cooling Tower |
| Water Pressure: 4kg/cm2; Pressure Drop: 2kg/cm2 | |||||
Cooling Water | Inlet: 18°C; Outlet: 25°C; Standard: 20±1°C | ||||||
Polycold | Optional | ||||||
Air Compressor | 3HP (Air Pressure: 6 ~ 8 kg/ cm2) | ||||||
Grounding Resistance | Under 5Ω | ||||||
Electrical Control System | PLC+PC (Windows system) | ||||||
Total Power Requirement | 35KW | 40KW | 60KW | ||||
Meissner Trap | Cryogenic Refrigerator (-110 ~ -140°C) | ||||||
Environment Requirement | Class 100,000 Clean Room; Epoxy flooring; Air-conditioning; Temp. 25±3°C; HUM50±10% | ||||||
Remarks | The specific configuration of coating equipment can be designed according to process requirements of coating | ||||||